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  • 1
    ISSN: 1057-9257
    Keywords: ZnSe ; ZnSSe ; GaAs substrate ; MOVPE ; Photoluminescence ; Quantum well ; Interface properties ; Growth interruption ; Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Electrical Engineering, Measurement and Control Technology , Physics
    Notes: In this work we report on ZnSxSe1 - x/ZnSe quantum wells grown by atmospheric pressure MOVPE on GaAs substrates. Diethylznc (DEZn), diethylselenium (DESe), diethylsulphur (DES) and H2S were used as source materials. Binary quantum wells with ZnSe or ZnS as barrier were usually grown in sets of 10 pairs on a 0.5 μm ZnSe or ZnS buffer, respectively. QWs with different well thicknesses (1-4 nm) show a typical shift to higher energies with decreasing well thickness and also a large decrease in PL intensity with increasing well thickness. Owing to the onset of relaxation above 5 nm well thickness, no PL emission could be observed. QWs of the same thickness but grown at different temperatures (420-520°C) show a broadened line shape with decreasing growth temperature. Growth interruption (3-50 s) also causes a broadening of the PL emission with decreasing interruption time. This is caused by interface reconstruction at higher growth temperatures and longer growth interruption. A ZnS buffer of 0.5 μm improves the PL line shape compared with a ZnSe buffer.ZnSxSe1 - x/ZnSe single and multiple QWs (Lz = 1-4 nm) were grown to reduce the strain in the structures. A typical quantum confinement energy shift of 160 meV for the 1 nm well can be observed in ZnS0.68Se0.32/ZnSe QWs. In comparison with the binary QWs, the FWHM could be reduced by about a factor of two to 34 meV. This improvement was obtained by an optimisation of the switching process to prevent the desorption of sulphur from the ZnSSe during the growth interruption.
    Additional Material: 6 Ill.
    Type of Medium: Electronic Resource
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  • 2
    ISSN: 1057-9257
    Keywords: ZnSe ; ZnSxSe1 - x ; MOVPE ; Photoluminescence ; Mapping ; Purified ; DESe source ; Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Electrical Engineering, Measurement and Control Technology , Physics
    Notes: In this paper we report new results concerning the cause of impurities responsible for the Ix, and I2-peaks in photoluminescence (PL) spectra of ZnSe grown by MOVPE. An improvement in ZnSe epilayer quality is obtained by using a metal organic selenium precursor with reduced chlorine concentration. The PL spectrum of such a layer shows typical excitonic transitions, but compared with samples grown with a more contaminated source, the intensity of the Ix, and the I2 peaks decreases relative to the free exciton transition. A Gaussian fitting of the donor-bound exciton peaks taking the background of other structures into account shows that the ratio between the Ix and I2 peaks does not differ significantly between two samples. Both the decrease in donor-bound exciton transitions and the unchangeability of the ratio Ix/I2lead to the conclusion that only chlorine impurities are responsible for Ixand Ix. In order to verify the homogeneity of impurity uptake across a 2 inch wafer, we performed PL mapping of ZnSxSe1 - x layers. Mapping of a 2 inch ZnSe wafer shows that the FWHM of Ix across a wafer does not vary significantly (1.55 ± 0.21 meV). On mapping a 2 inch ZnS0.3Se0.7 wafer fabricated with H2S as the sulphur source at TD = 480°C, we found a rotational symmetric dstribution of sulphur in the layer. The sulphur content x at the centre is nearly constant. The difference in x between the centre and the boundary of a bad surface region at the edge of the wafer is less than Δx = 0.045. The FWHM of the band edge luminescence follows the same tendency across the wafer. The dependence of homogeneity on the reactor design as well as the uptake of unintentional impurities from the precursor is discussed in detail.
    Additional Material: 6 Ill.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 63 (1988), S. 492-499 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: GaAs epitaxial layers (0.5 μm〈d〈4 μm) were grown by molecular-beam epitaxy (MBE) on (100) Si substrates (2° off in 〈011〉 direction) by using the two-step growth mode. The structural properties of the grown films (lattice constants, misorientation, crystal quality) have been measured by high-resolution double-crystal x-ray diffraction. The GaAs layers are under biaxial tensile strain at temperatures below the growth temperature because of the difference in thermal expansion coefficients of GaAs and Si. With the use of temperature-dependent photoluminescence and excitation spectroscopy, the band edges as well as the dominant near-band-edge recombination processes have been determined. Excitonic resonances are clearly observed in the excitation spectra. The strain splitting between the heavy- and light-hole valence bands amounts to 13 meV at 4.5 K. The dominant low-temperature luminescence line at 1.489 eV is assigned to exciton-related recombination processes. In addition to the band-to-carbon acceptor (e,A0C) recombination at 1.470 eV, a defect-related (d,A0C) recombination process is identified at 1.411 eV for a sample temperature of 4.5 K. The defect concentration is higher near the GaAs to Si interface region and decreases with increasing GaAs layer thickness. With increasing temperature (80–300 K) the valence-band splitting diminishes and reaches a value of 9 meV at room temperature, in good agreement with the strain values determined by x-ray diffraction.
    Type of Medium: Electronic Resource
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