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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 65 (1994), S. 2947-2952 
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: The mean plasma potential was measured on the LBL advanced electron cyclotron resonance (AECR) ion source for a variety of conditions. The mean potentials for plasmas of oxygen, argon, and argon mixed with oxygen in the AECR were determined. These plasma potentials are positive with respect to the plasma chamber wall and are on the order of tens of volts. Electrons injected into the plasma by an electron gun or from an aluminum oxide wall coating with a very high secondary electron emission reduce the plasma potential as does gas mixing. A lower plasma potential in the AECR source coincides with enhanced production of high charged state ions indicating longer ion confinement times. The effect of the extra electrons from external injection or wall coatings is to lower the average plasma potential and to increase the neτi of the ECR plasma. With sufficient extra electrons, the need for gas mixing can be eliminated or reduced to a lower level, so the source can operate at lower neutral pressures. A reduction of the neutral pressure decreases charge exchange between ions and neutrals and enhances the production of high charge state ions. An aluminum oxide coating results in the lowest plasma potential among the three methods discussed and the best source performance.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 61 (1990), S. 793-798 
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: We have obtained excellent agreement between BEAM-3D calculations and beam profile and emittance measurements of the total extracted beam from the room temperature electron cyclotron resonance (RTECR), when a low degree of beam neutralization is assumed in the calculations, as will be presented in this paper. The beam envelope has approximately a quadratic dependence on drift distance, and space-charge effects dominate the early beam formation and beamline optics matching process.
    Type of Medium: Electronic Resource
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  • 3
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: A new 14 GHz ECR ion source for the ATLAS facility is under construction. The new source is an evolution of the 14 GHz AECR Lawrence Berkeley source. The new source will feature an all-aluminum hexapole main chamber and enhanced peak radial and solenoid magnetic fields compared to the existing AECR. Most of the other design features of the existing source are maintained in this design. The new source will be mounted on a new 300 kV high-voltage platform in order to match the velocity requirements of the existing PII injector linac. Achieving the very precise goal of a few electrical microamps of 238U+33 from this source will allow the ATLAS facility to provide Coulomb-barrier energies of uranium without the use of an additional stripper foil and will significantly enhance the capabilities of ATLAS for the heaviest of beams. The project status and more details of the source system design are discussed. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 4
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: Electron cyclotron resonance ion source (ECRIS) development has progressed with multiple-frequency plasma heating, higher mirror magnetic fields, and better technique to provide extra cold electrons. Such techniques greatly enhance the production of highly charged ions from ECRISs. So far at continuous wave (CW) mode operation, up to 300 eμA of O7+ and 1.15 emA of O6+, more than 100 eμA of intermediate heavy ions for charge states up to Ar13+, Ca13+, Fe13+, Co14+, and Kr18+, and tens of eμA of heavy ions with charge states to Kr26+, Xe28+, Au35+, Bi34+, and U34+ were produced from ECRISs. At an intensity of at least 1 eμA, the maximum charge state available for the heavy ions are Xe36+, Au46+, Bi47+, and U48+. An order of magnitude enhancement for fully stripped argon ions (I≥60 enA) were also achieved. This article will review the ECR ion source progress and discuss key requirement for ECRISs to produce the highly charged ion beams. © 1998 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 5
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: The LBNL third generation electron cyclotron resonance (ECR) ion source has progressed from a concept to the fabrication of a full scale prototype superconducting magnet structure. This new ECR ion source will combine the recent ECR ion source techniques that significantly enhance the production of high charge state ions. The design includes a plasma chamber made from aluminum to provide additional cold electrons, three separate microwave feeds to allow multiple-frequency plasma heating (at 10, 14, and 18 GHz or at 6, 10, and 14 GHz) and very high magnetic mirror fields. The design calls for mirror fields of 4 T at injection and 3 T at extraction and for a radial field strength at the wall of 2.4 T. The prototype superconducting magnet structure which consists of three solenoid coils and six race track coils with iron poles forming the sextupole has been tested in a vertical Dewar. After training, the sextupole magnet reached 105% of its design current with the solenoids off. With the solenoids operating at approximately 70% of their full design field, the sextupole coils operated at 95% of the design value which corresponds to a sextupole field strength at the plasma wall of more than 2.1 T. © 1998 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 66 (1995), S. 4218-4221 
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: The performance of the Lawrence Berkeley Laboratory (LBL) advanced electron cyclotron resonance ion source, which is a single stage source designed to operate at 14 GHz alone (single-frequency heating), is enhanced by heating the plasma simultaneously with microwaves of 10 and 14 GHz (two-frequency heating). Production of high charge state ions was increased a factor of 2–5 or higher for the very heavy ions such as bismuth and uranium, as compared to single- frequency heating. Plasma stability was improved and the ion charge state distribution shifted to higher charge state. With two-frequency heating, the source can produce more than 1×109 pps of fully stripped argon. High charge state ion beams of bismuth and uranium produced by the source were injected into the 88-Inch Cyclotron at LBL. After acceleration to energies greater than 6 MeV/nucleon, the extracted beam intensities were 1×106 pps or higher for Bi50+,51+ and 238U52+,53+. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 7
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: We have obtained excellent agreement between BEAM-3D calculations and beam profile and emittance measurements of the total extracted beam from the room temperature electron cyclotron resonance (RTECR), when a low degree of beam neutralization is assumed in the calculations, as will be presented in this paper. The beam envelope has approximately a quadratic dependence on drift distance, and space-charge effects dominate the early beam formation and beamline optics matching process.
    Type of Medium: Electronic Resource
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