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  • Induction plasma  (2)
  • Cationic-anionic surfactant  (1)
  • Springer  (3)
  • Wiley-Blackwell
  • BMJ Publishing
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  • Springer  (3)
  • Wiley-Blackwell
  • BMJ Publishing
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  • 1
    ISSN: 1435-1536
    Keywords: Cationic-anionic surfactant ; fluorescence probe ; micelle ; vesicle
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Notes: Abstract Pyrene andp-N,N-dimethylaminostyrylphenylmalononitrile are used as the fluorescence probes to study the micro environment and observe the excimer formation of pyrene in sodium alkylcarboxylate and alkyltrimethyl ammonium bromide mixed solutions. The micro polarity, micro-dielectric constants and micro viscosity of the self-organized assemblies in the mixed cationi-anionic surfactant solution were compared before and after sonication, which may form different organized assemblies (micelle or vesicle). The micelle and vesicles have almost the same polarity for the probing molecules whereas the microviscosity differs. The variation of fluorescence quenching curves also shows the different effect of the change of assembly forms (micelles to vesicles). Thus some novel physicochemical properties about the micro environment of the cationic-anionic surfactant assemblies were found from this report.
    Type of Medium: Electronic Resource
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  • 2
    ISSN: 1572-8986
    Keywords: Induction plasma ; modeling ; chemical equilibrium ; silicon nitride synthesis
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract A mathematical model is presented for the numerical simulation of the flow, temperature, and concentration fields in an rf plasma chemical reactor. The simulation is performed assuming chemical equilibrium. The extent of validity of this assumption is discussed. The system considered is the reaction of SiCl4 and NH3 for the production of Si3N4.
    Type of Medium: Electronic Resource
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  • 3
    ISSN: 1572-8986
    Keywords: Induction plasma ; modeling ; chemical kinetics ; dissociation of silicon tetrachloride
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract A kinetic model has been developed for the prediction of the concentration gelds in an rf plasma reactor. A sample calculation for a SiCl4/H2 system is then performed. The model considers the mixing processes along with the kinetics of seven reactions involving the decomposition of these reactants. The results obtained are compared to those assuming chemical equilibrium. The predictions indicate that an equilibrium assumption will result in lower predicted temperature fields in the reactor. Furthermore, for the chemical system considered here, while differences exist between the concentration fields obtained by the two models, the differences are not substantial.
    Type of Medium: Electronic Resource
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