Cubic boron nitride
Polymer and Materials Science
Wiley InterScience Backfile Collection 1832-2000
Chemistry and Pharmacology
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Single-phase cubic boron nitride films of high quality might be of great importance as superhard wear-resistant coatings and semiconductive materials. This paper reviews deposition techniques, precursors, deposition parameters and substrates employed in plasma-assisted CHEMICAL VAPOR DEPOSITION (PACVD) of cubic boron nitride (c-BN) as well as procedures applied for the characterization of c-BN-containing films. Mechanisms of the formation of sp3-hybridized boron nitride during PACVD by use of either high-energy nitrogen and argon ions or hydrogen plasmas are discussed. All experimental results on PACVD of c-BN are thought to fit either “physical” or “chemical” routes for c-BN low-pressure synthesis, which are based on principles of c-BN physical vapor deposition or diamond CVD.
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