Heat and mass transfer
vapor contamination effect
Springer Online Journal Archives 1860-2000
Chemistry and Pharmacology
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Abstract Heat transfer to a copper particle immersed into an argon plasma is considered in this paper, including the effects of contamination of the plasma (transport coefficients) by copper vapor from the particle. Except for cases of high plasma temperatures, the vapor content in the plasma is shown to have a considerable influence on heat transfer to a nonevaporating particle, and, to a lesser extent, on heat transfer to an evaporating particle. Evaporation itself reduces heat transfer to a particle substantially as shown in a previous paper [Xi Chen and E. Pfender, Plasma Chem. Plasma Process.,2, 185 (1982)]. Comparisons of the calculated results with those based on a method suggested in the above reference show that the simplified assumptions employed, i.e., that the surface temperature is equal to the boiling point and that plasma properties based on a fixed composition are applicable, can be employed to simplify calculations for many cases. This study reveals that a considerable portion of a particle must be vaporized before a steady concentration distribution is established around the particle.
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